ion-beam lithography
ion projection lithography
A synthesis technique that uses ions to transfer a pattern to a substrate. The substrate is coated with a film (or 'resist) and a focused ion beam (75 keV He ions) is scanned across a patterned mask inducing chemical reactions in the resist. The desired pattern is obtained by selectively removing either exposed or non-exposed regions of the resist ('developing').
ion-projection lithography
IPL
CHMO:0001408