lithography
near-field phase shift lithography
CHMO:0001409
near field phase shift lithography
A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. A transparent PDMS mask with the desired pattern (in relief) on its surface is placed in contact with the photoresist layer. UV light (300–460 nm) is then used to cross-link the polymer. Light passing through the stamp is modulated in the near-field by the relief of the mask such that the edges of the relief structures correspond to nulls in the intensity of the light. The polymer is cross-linked in the remaining areas.
near-field photolithography
near field optical lithography
NFPSL
near-field optical lithography
near-field phase-shift lithography
near-field conformational photolithography
near field photolithography